PRODUCTS

PULSED LASER DEPOSITION

Pulsed Laser Deposition with a Quantel make laser operating at 355nm, 6ns pulse width and 10Hz repetition rate at CAT, Indore. PLD technique is being used to grow thin Films and Nanostructurs of Oxide semiconductor (ZnO) and related materials and Si. Bottom left: Laser ablated Plume of LCMO target at a laser fluence of 4 J/cm2 and O2 partial pressure of 200 mbarr. Bottom right : Laser ablated Plume of ZnO target at a laser fluence of 0.6 J/cm2 and O2 partial pressure of 1x10-5 torr.

Pulsed Laser Deposition with a Quantel Brilliant laser, growth of ZnO thin films, nano structured Carbon thin films, growth of nanostructured CeO2 thin films, preparation of carbon nano tubes,growth of Palladium coated WO3 thin films, growth of Y3Al5O12 : Ce phosphor thin films. This work is being done at Indian Institute of Technology, Chennai(Physics Department)

Pulsed Laser Deposition of Fe2O4 thin films with a Quantel Brilliant laser. This work is being done at Indian Institute of Technology, Mumbai (Physics Department)